Nova Metrion exceeds itself in secondary ion mass spectrometry

Nova has announced that "one of the world's leading" memory manufacturers has recently selected the Nova Metrion^® platform for its most advanced DRAM R&D as well as DRAM and NAND high-volume manufacturing lines. Nova expects to receive additional orders from this customer as the manufacturer expands its inline metrology capabilities.

Nova Metrion provides tighter process control and improves yield by allowing inline SIMS measurements of materials composition depth profiles in next-generation devices. The platform selection was based on its ability to perform full-wafer measurements of epitaxial layers, with high sensitivity and precision.

Nova Metrion breakthrough technology enables advanced process control of complex and critical multilayer films. It is designed from the ground up for a high-volume manufacturing environment and provides quantitative and actionable results with high-depth resolution and precision.

The Metrion introduces a unique in-line composition profiling capability for key process control measurements, including dopant concentration, contamination, residues, and diffusion, which cannot be obtained by other measurement techniques.

"Bridging the chasm between lab and fab environments is becoming a critical factor in enabling next-generation device manufacturing," said Gaby Waisman, President and Chief Executive Officer of Nova. "Our ability to provide customers with unique solutions like the Nova Metrion, addresses the increasing need for materials process control in advanced memory and logic devices."

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