Quick & Reliable Sulfur Content Measuring

15 May 2012
Roger Wayman
Administrator / Office Personnel

Warwick Analytical Service (WAS) now offers a routine service for precise determination of sulfur from ppm to % levels using Inductively Coupled Plasma - Optical Emission Spectrometry (ICP-OES). The Sulfur method is covered by the company's ISO 17025 and UKAS accreditation.

Measuring Sulfur by ICP-OES measures the total sulfur, both organic and inorganic. Due to the sensitivity of the technique a broad range of sample weights can be used making the method applicable to a wide cross section of samples. The sample is digested, typically using microwave digestion. The sample solution is then passed though a nebulizer and aspirated into the plasma. The sulfur content is then measured using emission lines around 182 nm.

Traditionally Sulfur is measured by a variety of methods many of which are time consuming and suffer from interferences. However using ICP-OES can provide a rapid analysis with simple sample preparation. Offering multiple analyte analysis with excellent speed, sensitivity and large linear dynamic range.

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