XEI Scientific launches Evactron® CombiClean™ at M&M 2011

XEI Scientific Inc, manufacturers of more than 1,100 EVACTRON® De-Contaminator Plasma Cleaning Systems for electron microscopes and other vacuum chambers, announces the release of their new Evactron® CombiClean™ system which simplifies the control and operation of plasma radical sources for both column and desktop cleaning of specimens for electron columns used in SEMs, TEMs and FIBs.

With over 1,100 Evactron De-Contamination systems in use primarily on electron columns (SEMs, TEMs and FIBs), XEI Scientific is expanding applications of their effective downstream plasma cleaning technology. Earlier this year XEI introduced the Evactron® SoftClean™ Chamber which allows users to mount Evactron Plasma Radical Sources (PRS's) onto a desktop vacuum chamber to provide the same effective removal of problematic hydrocarbon contamination from samples, holders and other parts before they are placed in the electron column.

Using RF and a patented hollow cathode electrode, Evactron systems produce a plasma that is contained in the PRS module. Reactive gas radicals are generated and drawn into the sample chamber where they chemically break down unwanted hydrocarbon molecules into smaller constituents which are then easily removed by the instrument's vacuum system.

At the Microscopy and Microanalysis meeting in Nashville, TN on August 7-11, XEI Scientific will introduce the Evactron CombiClean™ System to simplify the control and operation of multiple PRS modules on columns and desktops. With a new integrated controller and vacuum chamber, operators can easily select which PRS is active via the system front panel and seamlessly switch between column cleaning and desktop de-contamination of parts destined for use in the microscopes.

Other benefits include multiple insertion ports for cleaning TEM sample holders. The cleaning chamber may function as a secure, long-term storage container for decontaminated samples. It has a large circular lid for convenient access to insert samples, while dry nitrogen purging prevents back streaming after plasma cleaning and during sample storage to allow the use of rotary vane pumps. Attractively priced and with a small footprint, this new cleaning solution continues the nearly 20 year tradition established by XEI of providing cost effective and innovative solutions to improve the performance of electron and ion imaging tools.