CLARIS Ion implanter for semiconductors
The interface between people and their way of life: LSI (semiconductors)
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No better application of such system
Ion implantation of SiC and GaN
Efficient and productive
Review Date: 15 Nov 2021 | Nissin Ion Equipment Co.
Diverse applications
As equipment that is indispensable in the manufacture of a variety of semiconductor products like computer CPUs, DRAM, flash memory, and system LSI, as well as the microcomputers and inverters that are built into electric appliances, in-vehicle semiconductors, and image sensors for digital cameras, Nissin Ion Equipment’s ion implanter for semiconductor is used all over the world.
Device miniaturization
With the further miniaturization of semiconductor devices in recent years, greater precision and higher productivity in ultra-shallow junction formation are in huge demand. To address this, Nissin Ion Equipment has released CLARIS, the world’s first ion implanter to utilize cluster ions of ionized cluster molecules such as B10H14 (decaborane) and B18H22 (octadecaborane) and thus enables high productivity and high-quality ion implantation even under the extremely low energy of 500 eV or less that is required in order to achieve ultra-shallow junction formation.
Features
- Ion type : B18Hx+, B10Hx+, C16Hx+, C14Hx+, C7Hx+, P4+, As4+, etc.
- Dose : 5E10 to 1E17
- (Acceleration)Energy : 4 to 80 keV
