Products & ReviewLife Sciences
JBX-8100FS
Direct Write E-beam Lithography System
Silicon Columns
The supplier does not provide quotations for this product through SelectScience. You can search for similar products in our Product Directory.
JEOL has more than 50 years of e-beam expertise. Our latest generation of direct write tools, the JEOL JBX-8100FS series spot beam, vector scan, step-and-repeat lithography system is designed for higher throughput and lower operating costs. The JBX-8100FS writes ultrafine patterns at a faster rate of speed while minimizing idle time, especially during the exposure process, thus increasing throughput.
Key Features:
- Small footprint
- Low power consumption
- High throughput
- ZrO/W (Schottky) Emitter
- Stage positions measured and controlled in 0.6nm steps (0.15nm steps optional)
- Field size 100 μm × 100 μm (high resolution mode) and 1,000 μm × 1,000 μm (high throughput mode)
- Overlay accuracy ±9 nm or less (high resolution mode) and ±20 nm or less (high throughput mode)
- Sample size - wafers up to 200mm, masks up to 6-inch, micro samples of any size
