SU-8 3000
SU-8 3000 is a high contrast, epoxy based photoresist designed for micromachining and other microelectronic applications, where a thick, chemically and thermally stable image is desired.
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Review Date: 26 Mar 2019 | MicroChem
SU-8 3000 is a high contrast, epoxy based photoresist designed for micromachining and other microelectronic applications, where a thick, chemically and thermally stable image is desired.
SU-8 3000 is an improved formulation of SU-8 and SU-8 2000, which has been widely used by MEMS producers for many years. SU-8 3000 has been formulated for improved adhesion and reduced coating stress. The viscosity range of SU-8 3000 allows for film thicknesses of 4 to 120 µm in a single coat.
SU-8 3000 has excellent imaging characteristics and is capable of producing very high, over 5:1 aspect ratio structures. SU-8 3000 has very high optical transmission above 360 nm, which makes it ideally suited for imaging near vertical sidewalls in very thick films. SU-8 3000 is best suited for permanent applications where it is imaged, cured and left on the device.
Features:
- Improved adhesion
- Reduced coating stress
- High aspect ratio imaging
- Vertical sidewalls
- Greater than 100 µm film thickness in a single coat
- Excellent dry etch resistance
Material uses:
- Waveguides
- Microfluidics
- Stamps