TSKgel Phenyl-3PW (20) Resin
TSKgel Phenyl-3PW (20) process resin provides a novel solution for the purification of oligonucleotides. This resin is capable of cleaving DMT protective groups on-column in order to streamline downstream bioprocessing of complex oligo species.
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TSKgel® Phenyl-3PW (20) resin is a hydrophobic interaction chromatography (HIC) resin designed for oligonucleotide purification. This resin features phenyl group ligands functionalized on a 20 µm polymethacrylate base particle with 25 nm pores, which binds approximately 2.5 times more oligonucleotides than TSKgel Phenyl-5PW.
TSKgel Phenyl-3PW (20) resin efficiently purifies oligonucleotides with both DMT and MMT protection groups, ensuring high purity and yield. Its versatility reduces the need for multiple resins, streamlining processes for manufacturers and improving process economics.
TSKgel PW resins’ high degree of crosslinking results in high chemical and mechanical stability, allowing rigorous cleaning-in-place (CIP) and fast flow rates.
