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Measuring inorganic impurities in semiconductor manufacturing

27 Jul 2022

The new edition of the Agilent ICP-QQQ Semiconductor Applications Compendium contains 20+ optimized methods to measure impurities in:

  • Wafer precursor and substrate materials
  • Ultrapure water and hydrogen peroxide
  • Acids and other process chemicals
  • Solvents and other organic chemicals
  • High purity metals
  • Precursor and process gases

The methods include instrument configuration and tuning parameters, sample and standard preparation details and representative results.

The compendium will be a valuable resource for suppliers to fab plants aiming to control inorganic impurities to meet product specifications.

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