Measuring inorganic impurities in semiconductor manufacturing

The new edition of the Agilent ICP-QQQ Semiconductor Applications Compendium contains 20+ optimized methods to measure impurities in:

• Wafer precursor and substrate materials
• Ultrapure water and hydrogen peroxide
• Acids and other process chemicals
• Solvents and other organic chemicals
• High purity metals
• Precursor and process gases

The methods include instrument configuration and tuning parameters, sample and standard preparation details and representative results.

The compendium will be a valuable resource for suppliers to fab plants aiming to control inorganic impurities to meet product specifications.