Multi-modal characterization with secondary ion mass spectrometry on ZEISS ORION NanoFab

In recent years, ZEISS ORION NanoFab has been recognized for its outstanding capabilities in high-resolution imaging and nanofabrication. Based on the Gas Field Ion Source (GFIS) technology, it is capable of generating both helium and neon ion beams with very small spot sizes and high brightness, enabling high-resolution imaging and fabrication of structures with less than 10 nm feature size. While the secondary electrons released from the specimen provide unique contrast and a very high surface sensitivity, ORION NanoFab’s analytical microscopy capabilities remain limited.