Sub-10 nm Nano-machining with Multiple Ion Beams for High Precision and High Throughput Applications

Direct write focused ion beam (FIB) machining represents the quickest, most flexible method to fabricate nanodevices for prototyping or research applications. This white paper discusses the ORION NanoFab multiple beam solution and how this integrated instrument provides throughput, flexibility, and device dimension gains over what is possible with lithographic or FIB-only approaches.