Imec Confirms Bruker’s New Dimension Icon® SSRM-HR Atomic Force Microscope Configuration Offers Highest Resolution Carrier Profiling Capability

Bruker announced today the release of the Dimension Icon® SSRM-HR, a new atomic force microscope (AFM) configuration including the Scanning Spreading Resistance Microscopy (SSRM) module, designed specifically for high-resolution (HR) semiconductor characterization. Integrating Bruker’s industry-leading Dimension Icon AFM platform with an environmental control system capable of 1ppm gas purity and high-vacuum control, the Dimension Icon SSRM-HR system provides vastly improved repeatability and spatial resolution in semiconductor carrier profiling. As confirmed by Imec (www.imec.be), buried gate oxide layers as thin as 5Å are detected routinely.

“As our customers continue to improve their products to follow the semiconductor roadmap, higher spatial resolution electrical characterization is a key requirement,” said David V. Rossi, Executive Vice President and General Manager of Bruker's AFM Business. “The new Dimension Icon SSRM-HR combines the leading productivity and large programmable stage of our top performance AFM platform with atomic resolution, and the most accurate carrier profiling optimization to meet the specific demands of next-generation technology nodes.”

“We chose Bruker because they offer the only solution that meets our needs,” added Prof. Vandervorst, Imec Fellow and Department Head, Materials and Components Analysis, based in Leuven, Belgium. “Our decision followed a rigorous evaluation of spatial resolution and repeatability in carrier profiling. Being at the forefront in tackling the roadblocks to continued technology scaling means we have the most stringent requirements.”

About Dimension Icon SSRM-HR
Dimension Icon SSRM-HR constitutes a new AFM configuration that integrates the large stage, low drift, and finest force control of the Dimension Icon platform with the Scanning Spreading Resistance Microscopy (SSRM) application module, SSRM-DIA probes, and high-end environmental control. Following seamless sample transfer from a high vacuum sample preparation chamber, oxygen and water are controlled at the 1ppm level during AFM imaging. The environmental control system is compatible with all released Dimension Icon accessories and application modules, further extending its benefits to additional applications.