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The H-9500 is a high performance TEM featuring a single crystal LaB6 electron source. This allows 0.102 nm crystal lattice resolution and 0.18 nm point to point to be achieved. The instrument features a low magnification operating mode of x200 to x500 and a high magnification mode with zoom from x1000 to x1,500,000. Fully PC-controlled, the instrument has an icon-driven user interface and is designed for very fast operation. W…

This entry-level instrument utilizes ratio beam optics to give exceptional stability for a host of applications including photometry, and offers full scanning capabilities. Routine analyses are readily carried out using the simple-to-use photometry, wavelength scan, and time scan modes. The UV-Visible Ratio-Beam Spectrophotometer U-5100 also features an eco-friendly design using an ultra long-life pulsed Xe lamp and easy opera…

The S-3700N features an ultra large specimen chamber and stage to allow observation of specimens at diameters up to 300mm. Hitachi Variable Pressure SEM (VP-SEM) series have been received with high reputation from customers around the world. They feature low vacuum observation method (6 – 270 Pa) which enables observation of non-conductive samples like electronic components, and water containing samples such as cultured cells,…

Hitachi offers the sleek HT7700 for maximum performance and productivity. The radical design incorporates the ergonomics and user friendliness of a SEM with advanced automation, resolution and analytical capabilities of a TEM. Imaging is completely digital – you won’t find a viewing or projector chamber - and Hitachi’s EMIP-SP database software automatically catalogues your single frame and montaged images. The turbopump evacu…

The HD-2700 is the top-of-the-range STEM featuring optional spherical aberration correction developed in collaboration with CEOS GmbH ot offer significantly improved resolution and analytical sensitivity. By correcting the spherical aberration resolution of less than 0.1 nm can be achieved in dark-field STEM mode. The Cs corrector is field retrofittable for any HD-2700 system that was originally ordered without the Cs correcto…

The HF-3300 300 kV FE TEM is a powerful analytical and high resolution TEM/STEM with inherent high beam brightness, high coherence, high energy resolution, and Hitachi unique functions! Features • High energy-resolution and high beam current • Parallel nanobeam electron diffraction for high precision stress analysis • Spatially-resolved EELS for instant multipoint compositional and chemical binding state analyses • Double-bipr…

The Hitachi NB5000 FIB-SEM integrates a superior 40kV Ga ion FIB column with an ultra-high-resolution Schottky FE-SEM. Like all our products, all components have been designed with consideration of the total system performance. This results in exceptional stability, milling performance and resolution, allowing e.g. automated mill-and-monitor operations for 3D reconstructions with slicing steps down to 5nm. NB5000 incorporate…

The Hitachi IM4000 Ar Ion Milling System offers two milling configurations available in a single instrument: cross section cutting and wide-area sample surface fine polishing. The new Ar ion gun design, with increased milling rate (300µm/h for Si), affords reduced cross section processing times by as much as 65%. For added convenience, the IM4000 sample stage unit can be removed for specimen setting and cross section edge fine…

Sample surfaces are inevitably coated with hydrocarbon contamination due to sample preparation or from storage. The ZONE desktop sample cleaner/desiccator gently removes contaminations to reveal the true surface of your specimens. There are Two Models ZoneSEM ZoneSEM's sample holder stage was designed for Hitachi Type I and Type II carriers. Adjustable height and optional holders available. Provides effective cleaning of surfa…

The SU9000 Ultra High Resolution FE-SEM is Hitachi's new premium UHR FE-SEM. It features unique electron optics, with the sample positioned inside a gap of the split objective lens pole piece. This so-called true inlens concept - combined with the next generation of HITACHI's cold field emission technology - guarantees the highest possible imaging resolution (0.4nm @ 30kV, 1.2nm @ 1kV) and stability. To make this resolving pow…