FEI Opens a New Dimension in Photolithography Process Control

Fundamental limitations in performance of low-voltage scanning electron microscope (SEM) exist, notably resolution at low beam voltages. To overcome this limitation, the Verios Extreme High Resolution (XHR) SEM was developed to reveal fine surface detail with sub-nanometer resolution at very low beam voltages. The Verios XHR SEM is ideally suited to help characterize electron beam sensitive photoresist.