Using Beam Chemistries with SEM, FIB and DualBeam for Surface Modification

Charged particle beams in scanning electron microscope (SEM) and focused ion beam (FIB) equipment are generally used for imaging and direct surface modification of samples held under vacuum. FIB or SEM can accurately deposit or preferentially etch specific materials when small quantities of gas are introduced near to the sample surface whilst the beam is scanning. This allows quick and easy customization and modification of a wide range of structures on a micro and nano-scale. This application notes discusses the use of DualBeam, a combined FIB and SEM instrument, for such purposes.