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S-3400N Fully Automated VP SEM

The S-3400N is the World Class Variable Pressure SEM The S-3400N offers advances in automation including full filament saturation and “no touch” objective aperture alignment. The New Analytical Chamber Provides • Segment, Ultra Thin, Backscattered Electron Detector Capable of TV Rate Observation • Fully Automated with One Button Automatic "No Touch" Objective Aperture Alignment • Turbo Molecular Pump (TMP) Provides a Fast and…

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Hitachi High Technologies America, Inc.

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Average Rating 4.7

|2Scientists have reviewed this product

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Average Rating 4.3

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Catalyst and Materials Science

Easy sample introduction and extraction. Good instrument for research and education. Used by our integrated Materials Characterization lab with XRD, XRF, TA & FTIR.

Review Date: 16 May 2012 | Hitachi High Technologies America, Inc.

Average Rating 5.0

Environmental with 3D BSE detector. Works amazingly at obtaining high resolution images.

Review Date: 3 May 2011 | Hitachi High Technologies America, Inc.

The S-3400N is the World Class Variable Pressure SEM

The S-3400N offers advances in automation including full filament saturation and “no touch” objective aperture alignment.

The New Analytical Chamber Provides
• Segment, Ultra Thin, Backscattered Electron Detector Capable of TV Rate Observation
• Fully Automated with One Button Automatic "No Touch" Objective Aperture Alignment
• Turbo Molecular Pump (TMP)

Provides a Fast and Efficient 90 second Pump Down Time. The S-3400N is Hitachi’s newest addition to a world class Variable Pressure SEM line-up. Built on the success of the S-3000 series instruments, the S-3400N offers advances in automation including full filament saturation and “no touch” objective aperture alignment. A new analytical chamber provides a total of ten ports with three high take off angle ports for EDS, Full Focusing WDS, PBS, EBSD, and XRF. A BSE detector allows TV rate scanning and high resolution imaging. Hitachi’s fQuad variable gun bias and SE accelerator plate ensures high currents for low voltage applications now approaching Field Emission performance.

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