X'Pert3 MRD XL - XRD
Versatile research, development & quality XRD system
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Great
Epitaxial film analysis
Easy for use, and it is better for analysis the epitaxial films. With the help of additional support, it can be used for real-time and temperature measurement. Give us the better results.
Review Date: 16 Dec 2021 | Malvern Panalytical
Great.
Epitaxial film analysis
It is hard to measure small-sized samples. Also, the response is too slow, so that it takes too long for alignment. I also suggest to design the grid in the background of software.
Review Date: 8 Dec 2020 | Malvern Panalytical
Manufacturer's Response
Hello Bingqian Song, aligning and measuring small-sized samples can be a challenge. We would like to learn more about your specific problems. We can share with you some procedures that we have developed that will definitely help you. If you don’t mind, send us more details at joachim.woitok@malvernpanalytical.com.
We are happy with the XRD tools, one of our most important analysis methods.
Characterization of epi wafers
Easy to use XRD equipment. No coplaints. Very good expert support by Dr. Lars Grieger.
Review Date: 4 Dec 2020 | Malvern Panalytical
Manufacturer's Response
Hello Kai Christiansen, thanks for leaving a review on our X’Pert3 MRD XL. You are right, Lars Grieger is delighted to share his expertise with users of our equipment. Such good feedback makes the team here at Malvern Panalytical proud about our people in the field representing the performance and quality of our products.
Good results have been acquired until today using this equipment.
Materials engineering
The equipment is versatile, robust and perfectly suits the use for research.
Review Date: 26 Oct 2020 | Malvern Panalytical
Manufacturer's Response
Hello Otavio Berenguel, thank you very much for leaving such a good feedback on the X’Pert3 MRD XL. We at Malvern Panalytical are thrilled to hear that our equipment suits so well to your research activities.
The long and successful history of Malvern Panalytical's Materials Research Diffractometers (MRD) continues with the generation of X’Pert³ MRD XL. The improved performance and reliability of the new platform have added more analytical capability and power for X-ray scattering studies in:
- Advanced materials science
- Scientific and industrial thin film technology
- Metrological characterization in semiconductor process development
The X’Pert³ MRD XL handles wide range of applications with full wafer mapping up to 200 mm.
