Focused Ion Beam Microscopes (FIB) Products & Reviews

This system delivers unmatched capabilities for extreme large-volume 3D analysis, Ga-free sample preparation, and precise micromachining. Featuring an innovative, fully integrated femtosecond laser, it offers the fastest material removal rate with the highest cut face quality.

Within ZEISS Crossbeam Family you have the choice between Crossbeam 340 or Crossbeam 550. Exploit the variable pressure capabilities of Crossbeam 340. Or use Crossbeam 550 for your most demanding characterizations and choose the chamber size, standard or large, that best suits your samples.

FIB-SEM optimised for large-volume 3D examinations

FIB-SEM for the semiconductor sector with 200mm wafer coverage

FIB-SEM for the highest demands on TEM samples

JBX-A9 Electron Beam Lithography System

Direct Write E-beam Lithography System

E-Beam Mask/Reticle Writer

The Hitachi NB5000 FIB-SEM integrates a superior 40kV Ga ion FIB column with an ultra-high-resolution Schottky FE-SEM. Like all our products, all components have been designed with consideration of the total system performance. This results in exceptional stability, milling performance and resolution, allowing e.g. automated mill-and-monitor operations for 3D reconstructions with slicing steps down to 5nm. NB5000 incorporate…